OTHER SERVICES

Other
Services

From production and finishing to maintenance of photomasks in use, we provide services suited to your application and usage conditions.

01 / PELLICLE

Pellicle

New pellicle mounting to protect the photomask pattern surface.

Pellicle technical data

We mount pellicles to protect the pattern surface of a photomask from contamination. We check the product specifications and usage conditions and advise whether mounting is possible.

Cross-section where a particle on the pellicle is blurred and the mask pattern stays sharp — Particles stay out of focus on the wafer
Posi Type example.

Improved semiconductor production yield
Longer photomask cleaning intervals
Protection from contamination
Pattern isolation from contaminants during repeated use
Longer photomask service life

This is a new-mounting service. Replacement of a pellicle already in use is listed under Maintenance as Pellicle replacement.

02 / ANTI-FOULING COATING

Anti-Fouling Coating

A thin protective layer for contamination prevention and surface protection.

Coating technical data

We form a uniform thin protective layer on the patterned photomask surface. It lowers surface tension and adjusts the contact angle of water and oil to prevent contamination, while improving water repellency and surface hardness.

Cross-section comparing PR sticking on the lower mask surface during proximity exposure and removal by IPA pad scrubbing between uncoated and anti-fouling coated masks — Suppression of PR sticking on the lower mask surface and IPA pad scrubbing comparison
Posi Type example.

Contamination prevention and easier cleaning
Less chemical use and longer cleaning intervals
9H hardness retained to help prevent scratches
Longer service life and improved productivity

03 / MAINTENANCE

Maintenance

Cleaning service and Pellicle replacement. We consult based on your photomask's condition.

01 / CLEANING SERVICE

Cleaning service

We remove particles from the mask surface. After cleaning, customers can re-inspect and re-measure the mask.

This is a cleaning service we perform. A short guide for cleaning a mask yourself is in the technical support library.

02 / PELLICLE REPLACEMENT

Pellicle replacement

We remove pellicle film that is scratched, damaged, torn, or contaminated, clean the mask, and mount a pellicle again. Pellicles are used to improve semiconductor production yield, extend photomask cleaning intervals, protect against contamination, and extend service life.

This replaces a pellicle already in use. New mounting is listed under Pellicle.

Whether maintenance is possible, and under what conditions, may vary depending on the condition of the photomask.

04 / STELLA VISION SYSTEM

Stella Vision System

Stella Vision for Java is CAD/CAM software in three programs for pattern editing, router paths, and jig design.

Download the catalog

01 / FINE VISION

Fine Vision

Built for fine-pattern editing and etch compensation, including contour extraction, distance-based offset, and lead-frame shape correction.

02 / ROUTER VISION

Router Vision

Builds router NC programs automatically or semi-automatically from Gerber, DXF, and other CAD data. Path checks and a process scheduler reduce repeat work and machining mistakes.

03 / ZIG VISION

Zig Vision

For jig design. Supports PAD FLASH conversion, probe-pin optimization, and pin-data output with terminal numbers.

SharedDrawing and editing, contour extraction, data comparison, and design-rule checks

InputGerber, DXF, GDS2, ODB++, Bitmap, NC, DPF, HPGL/2

OutputGerber, DXF, GDS2, ODB++, NC, DPF, HPGL/2, PDF

Other Services